Search Results - Choutov, D. A.

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  1. 1
    Formation of ordered nanocluster arrays by self-assembly on nanopatterned Si(100) surfaces

    Formation of ordered nanocluster arrays by self-assembly on nanopatterned Si(100) surfaces by Winningham, Thomas A, Gillis, H.P, Choutov, D.A, Martin, Kevin P, Moore, Jon T, Douglas, Kenneth

    Published in Surface science
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  2. 2
    Low energy electron-enhanced etching of GaN/Si in hydrogen direct current plasma

    Low energy electron-enhanced etching of GaN/Si in hydrogen direct current plasma by GILLIS, H. P, CHOUTOV, D. A, MARTIN, K. P, PEARTON, S. J, ABERNATHY, C. R

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  3. 3
    Highly anisotropic, ultra-smooth patterning of GaN/SiC by low energy electron enhanced etching in DC plasma

    Highly anisotropic, ultra-smooth patterning of GaN/SiC by low energy electron enhanced etching in DC plasma by Gillis, H. P., Choutov, D. A., Martin, K. P., Bremser, M. D., Davis, R. F.

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  4. 4
    Low energy electron-enhanced etching of Si(100) in hydrogen/helium direct-current plasma

    Low energy electron-enhanced etching of Si(100) in hydrogen/helium direct-current plasma by Gillis, H. P., Choutov, D. A., Steiner, P. A., Piper, J. D., Crouch, J. H., Dove, P. M., Martin, K. P.

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  5. 5
    Applications of S-layers

    Applications of S-layers by Sleytr, U B, Bayley, H, Sára, M, Breitwieser, A, Küpcü, S, Mader, C, Weigert, S, Unger, F M, Messner, P, Jahn-Schmid, B, Schuster, B, Pum, D, Douglas, K, Clark, N A, Moore, J T, Winningham, T A, Levy, S, Frithsen, I, Pankovc, J, Beale, P, Gillis, H P, Choutov, D A, Martin, K P

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  6. 6
    Low energy electron-enhanced etching of GaAs(100) in a chlorine/hydrogen dc plasma

    Low energy electron-enhanced etching of GaAs(100) in a chlorine/hydrogen dc plasma by Gillis, H. P., Choutov, D. A., Martin, K. P., Song, Li

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  7. 7
    Patterning III-N Semiconductors by Low Energy Electron Enhanced Etching (LE4)

    Patterning III-N Semiconductors by Low Energy Electron Enhanced Etching (LE4) by Gillis, H.P., Christopher, M.B., Martin, K.P., Choutov, D.A.

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  8. 8
    Highly anisotropic, ultra-smooth patterning of GaN/SiC by low energy electron enhanced etching in DC plasma: III-V Nitrides and silicon carbide

    Highly anisotropic, ultra-smooth patterning of GaN/SiC by low energy electron enhanced etching in DC plasma: III-V Nitrides and silicon carbide by GILLIS, H. P, CHOUTOV, D. A, MARTIN, K. P, BREMSER, M. D, DAVIS, R. F

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