Search Results - Chuang, Shang-Shiun

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  1. 1
    Low-Temperature Microwave Annealing Processes for Future IC Fabrication-A Review

    Low-Temperature Microwave Annealing Processes for Future IC Fabrication-A Review by Lee, Yao-Jen, Cho, Ta-Chun, Chuang, Shang-Shiun, Hsueh, Fu-Kuo, Lu, Yu-Lun, Sung, Po-Jung, Chen, Hsiu-Chih, Current, Michael I., Tseng, Tseung-Yuen, Chao, Tien-Sheng, Hu, Chenming, Yang, Fu-Liang

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  2. 2
    Experimental Realization of a Ternary-Phase Alloy Through Microwave-Activated Annealing for Ge Schottky pMOSFETs

    Experimental Realization of a Ternary-Phase Alloy Through Microwave-Activated Annealing for Ge Schottky pMOSFETs by Hsu, Chung-Chun, Chi, Wei-Chun, Tsai, Yi-He, Chou, Chen-Han, Chen, Che-Wei, Chien, Hung-Pin, Chuang, Shang-Shiun, Luo, Guang-Li, Lee, Yao-Jen, Chien, Chao-Hsin

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  3. 3
    Dopant Activation in Single-Crystalline Germanium by Low-Temperature Microwave Annealing

    Dopant Activation in Single-Crystalline Germanium by Low-Temperature Microwave Annealing by LEE, Yao-Jen, CHUANG, Shang-Shiun, HSUEH, Fu-Kuo, LIN, Ho-Ming, WU, Shich-Chuang, WU, Ching-Yi, TSENG, Tseung-Yuen

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  4. 4
    Ultra-Shallow Junction Formation by Monolayer Doping Process in Single Crystalline Si and Ge for Future CMOS Devices

    Ultra-Shallow Junction Formation by Monolayer Doping Process in Single Crystalline Si and Ge for Future CMOS Devices by Chuang, Shang-Shiun, Cho, Ta-Chun, Sung, Po-Jung, Kao, Kuo-Hsing, Chen, Henry J. H., Lee, Yao-Jen, Current, Michael I., Tseng, Tseung-Yuen

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  5. 5
    Diamond-shaped Ge and Ge0.9Si0.1 gate-all-around nanowire FETs with four facets by dry etch technology

    Diamond-shaped Ge and Ge0.9Si0.1 gate-all-around nanowire FETs with four facets by dry etch technology by Yao-Jen Lee, Fu-Ju Hou, Shang-Shiun Chuang, Fu-Kuo Hsueh, Kuo-Hsing Kao, Po-Jung Sung, Wei-You Yuan, Jay-Yi Yao, Yu-Chi Lu, Kun-Lin Lin, Chien-Ting Wu, Hisu-Chih Chen, Bo-Yuan Chen, Guo-Wei Huang, Chen, Henry J. H., Jiun-Yun Li, Yiming Li, Samukawa, Seiji, Tien-Sheng Chao, Tseung-Yuen Tseng, Wen-Fa Wu, Tuo-Hung Hou, Wen-Kuan Yeh

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  6. 6
    Corrections to "Low-Temperature Microwave Annealing Processes for Future IC Fabrication-A Review"

    Corrections to "Low-Temperature Microwave Annealing Processes for Future IC Fabrication-A Review" by Lee, Yao-Jen, Cho, Ta-Chun, Chuang, Shang-Shiun, Hsueh, Fu-Kuo, Lu, Yu-Lun, Sung, Po-Jung, Chen, Hsiu-Chih, Current, Michael I., Tseng, Tseung-Yuen, Chao, Tien-Sheng, Hu, Chenming, Yang, Fu-Liang

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