Design and evaluation of a team-based interprofessional practice placement: A design-based research approach by Claeys, Tony, Dolmans, Diana H. J. M., de Nooijer, Jascha

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How does the external context affect an implementation processes? A qualitative study investigating the impact of macro-level variables on the implementation of goal-oriented prima... by Huybrechts, Ine, Declercq, Anja, Verté, Emily, Raeymaeckers, Peter, Anthierens, Sibyl

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Creating space to talk about patients' personal goals: experiences from primary care stakeholders by Boeykens, Dagje, Haverals, Reini, Sirimsi, Muhammed Mustafa, Timmermans, Lotte, Van de Velde, Dominique, De Vriendt, Patricia, Boeckxstaens, Pauline

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Self-management support in flemish primary care practice: the development of a preliminary conceptual model using a qualitative approach by Timmermans, Lotte, Boeykens, Dagje, Sirimsi, Mustafa Muhammed, Decat, Peter, Foulon, Veerle, Van Hecke, Ann, Vermandere, Mieke, Schoenmakers, Birgitte

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The gout epidemic in French Polynesia: a modelling study of data from the Ma’i u’u epidemiological survey by Pascart, Tristan, Wasik, Kaja A, Preda, Cristian, Chune, Valérie, Torterat, Jérémie, Prud’homme, Nicolas, Nassih, Maryline, Martin, Agathe, Le Masson, Julien, Rodière, Vahinetua, Frogier, Sylvain, Canova, Georges, Pescheux, Jean-Paul, Shan Sei Fan, Charles, Jauffret, Charlotte, Claeys, Patrick, von Baeyer, Sarah LeBaron, Castel, Stephane E, Emde, Anne-Katrin, Yerges-Armstrong, Laura, Fox, Keolu, Leask, Megan, Vitagliano, Jean-Jacques, Graf, Sahara, Norberciak, Laurène, Raynal, Jacques, Dalbeth, Nicola, Merriman, Tony, Bardin, Thomas, Oehler, Erwan

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CMP Slurry and Process Development for TSV Front-Side Polishing by Xu, Jinhai, Lin, Paul-Chang, Li, Pei, Zhu, Tony, Ma, Zhiyong, Chen, Danny, Pang, Keliang, Wang, Xucheng, Wang, Yuchun

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E-MRS 2008 Spring Conference Symposium J: Beyond Silicon Technology: Materials and Devices for Post-Si CMOS by Claeys, Cor, Peaker, Tony, Fompeyrine, Jean, Frank, Martin, Vanhellemont, Jan

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Novel CuCMP Slurry Evaluation for 45/40nm BEOL Low-k Technology and Beyond by Zhao, Feng, Liu, Hongtao, Hu, Tony, Chen, Feng, Liu, Kent, Deng, Wufeng, Cao, Junzhu, Zhou, Sky, Zhang, Jason, Zhou, Erico, Song, Kerry, Zhao, Jun, Bao, Ethan, Chen, Larry

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Preface by Claeys, Cor, Peaker, Tony, Svensson, Bengt, Vanhellemont, Jan

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