Search Results - Coulon, P.E.

  • Showing 1 - 7 results of 7
Refine Results
  1. 1
    Controlled fabrication of Si nanocrystals embedded in thin SiON layers by PPECVD followed by oxidizing annealing

    Controlled fabrication of Si nanocrystals embedded in thin SiON layers by PPECVD followed by oxidizing annealing by Perret-Tran-Van, S, Makasheva, K, Despax, B, Bonafos, C, Coulon, P E, Paillard, V

    Published in Nanotechnology
    Get full text
    Items that this one cites
    Items that cite this one
    Article
    Save to List
    Saved in:
  2. 2
    Tailoring of SiC nanoprecipitates formed in Si

    Tailoring of SiC nanoprecipitates formed in Si by Velisa, G., Trocellier, P., Thomé, L., Vaubaillon, S., Miro, S., Serruys, Y., Bordas, É., Meslin, E., Mylonas, S., Coulon, P.E., Leprêtre, F., Pilz, A., Beck, L.

    Get full text
    Items that this one cites
    Items that cite this one
    Article
    Save to List
    Saved in:
  3. 3
    Infrared spectroscopy and X-ray diffraction studies on the crystallographic evolution of La2O3 films upon annealing

    Infrared spectroscopy and X-ray diffraction studies on the crystallographic evolution of La2O3 films upon annealing by TSOUTSOU, D, SCAREL, G, DEBERNARDI, A, CAPELLI, S. C, VOLKOS, S. N, LAMAGNA, L, SCHAMM, S, COULON, P. E, FANCIULLI, M

    Get full text
    Items that this one cites
    Items that cite this one
    Article
    Save to List
    Saved in:
  4. 4
    Combining HRTEM–EELS nano-analysis with capacitance–voltage measurements to evaluate high-κ thin films deposited on Si and Ge as candidate for future gate dielectrics

    Combining HRTEM–EELS nano-analysis with capacitance–voltage measurements to evaluate high-κ thin films deposited on Si and Ge as candidate for future gate dielectrics by Schamm-Chardon, S., Coulon, P.E., Lamagna, L., Wiemer, C., Baldovino, S., Fanciulli, M.

    Get full text
    Items that this one cites
    Items that cite this one
    Article
    Save to List
    Saved in:
  5. 5
    Erratum to “Infrared spectroscopy and X-ray diffraction studies on the crystallographic evolution of La2O3 films upon annealing” Microelectronic Engineering 85 (2008) 2411–2413

    Erratum to “Infrared spectroscopy and X-ray diffraction studies on the crystallographic evolution of La2O3 films upon annealing” Microelectronic Engineering 85 (2008) 2411–2413... by Tsoutsou, D., Scarel, G., Debernardi, A., Capelli, S.C., Volkos, S.N., Lamagna, L., Schamm, S., Coulon, P.E., Fanciulli, M.

    Get full text
    Article
    Save to List
    Saved in:
  6. 6
    Erratum to “Infrared spectroscopy and X-ray diffraction studies on the crystallographic evolution of La 2O 3 films upon annealing” Microelectronic Engineering 85 (2008) 2411–2413

    Erratum to “Infrared spectroscopy and X-ray diffraction studies on the crystallographic evolution of La 2O 3 films upon annealing” Microelectronic Engineering 85 (2008) 2411–2413... by Tsoutsou, D., Scarel, G., Debernardi, A., Capelli, S.C., Volkos, S.N., Lamagna, L., Schamm, S., Coulon, P.E., Fanciulli, M.

    Get full text
    Article
    Save to List
    Saved in:
  7. 7
    Infrared spectroscopy and X-ray diffraction studies on the crystallographic evolution of La 2O 3 films upon annealing

    Infrared spectroscopy and X-ray diffraction studies on the crystallographic evolution of La 2O 3 films upon annealing by Tsoutsou, D., Scarel, G., Debernardi, A., Capelli, S.C., Volkos, S.N., Lamagna, L., Schamm, S., Coulon, P.E., Fanciulli, M.

    Get full text
    Article
    Save to List
    Saved in:

Search Tools: