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Advanced mask aligner lithography: new illumination system
by
Voelkel, Reinhard
,
Vogler, Uwe
,
Bich, Andreas
,
Pernet, Pascal
,
Weible, Kenneth J
,
Hornung, Michael
,
Zoberbier, Ralph
,
Cullmann, Elmar
,
Stuerzebecher, Lorenz
,
Harzendorf, Torsten
,
Zeitner, Uwe D
Published in
Optics express
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3D structures for micro-system technology using proximity lithography
by
Cullmann, Elmar
,
Lochel, Bernd
,
Engelmann, Gunter
,
Reyerse, Constant
Published in
Solid state technology
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