Highly Reliable, Scalable, and High-Yield HfZrOx FRAM by Barrier Layer Engineering and Post-Metal Annealing by Lin, Yu-De, Yeh, Po-Chun, Dai, Jheng-Yang, Su, Jian-Wei, Huang, Hsin-Hui, Cho, Chen-Yi, Tang, Ying-Tsan, Hou, Tuo-Hung, Sheu, Shyh-Shyuan, Lo, Wei-Chung, Chang, Shih-Chieh

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