Search Results - Decker-Lucke, Kurt

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    Cryogenic ion implantation near amorphization threshold dose for halo/extension junction improvement in sub-30 nm device technologies

    Cryogenic ion implantation near amorphization threshold dose for halo/extension junction improvement in sub-30 nm device technologies by Park, Hugh, Todorov, Stan, Colombeau, Benjamin, Rodier, Dennis, Kouzminov, Dimitry, Zou Wei, Guo Baonian, Khasgiwale, Niranjan, Decker-Lucke, Kurt

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    Cryogenic BF2+ Implantation near Amorphization Threshold Dose for Halo Junctions in Sub-30 nm Device Technologies

    Cryogenic BF2+ Implantation near Amorphization Threshold Dose for Halo Junctions in Sub-30 nm Device Technologies by Park, H. H., Todorov, S., Colombeau, B., Rodier, D., Decker-Lucke, K.

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