Search Results - Delenia, Eugene

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  1. 1
    Controlled removal of amorphous Se capping layer from a topological insulator

    Controlled removal of amorphous Se capping layer from a topological insulator by Virwani, Kumar, Harrison, Sara E., Pushp, Aakash, Topuria, Teya, Delenia, Eugene, Rice, Philip, Kellock, Andrew, Collins-McIntyre, Liam, Harris, James, Hesjedal, Thorsten, Parkin, Stuart

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  2. 2
    Reactive Vapor-Phase Inhibitors for Area-Selective Depositions at Tunable Critical Dimensions

    Reactive Vapor-Phase Inhibitors for Area-Selective Depositions at Tunable Critical Dimensions by Ogunfowora, Lawal Adewale, Singh, Ishwar, Arellano, Noel, Pattison, Thomas G., Magbitang, Teddie, Nguyen, Khanh, Ransom, Brandi, Lionti, Krystelle, Nguyen, Son, Topura, Teya, Delenia, Eugene, Sherwood, Mark, Savoie, Brett M., Wojtecki, Rudy

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  3. 3
    Additive Lithography–Organic Monolayer Patterning Coupled with an Area-Selective Deposition

    Additive Lithography–Organic Monolayer Patterning Coupled with an Area-Selective Deposition by Wojtecki, Rudy, Ma, Jonathan, Cordova, Isvar, Arellano, Noel, Lionti, Krystelle, Magbitang, Teddie, Pattison, Thomas G, Zhao, Xiao, Delenia, Eugene, Lanzillo, Nicholas, Hess, Alexander E, Nathel, Noah Fine, Bui, Holt, Rettner, Charles, Wallraff, Gregory, Naulleau, Patrick

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  4. 4
    Patterning ∼20nm half-pitch lines on silicon using a self-assembled organosilicate etch mask

    Patterning ∼20nm half-pitch lines on silicon using a self-assembled organosilicate etch mask by Sundström, Linnea, Krupp, Leslie, Delenia, Eugene, Rettner, Charles, Sanchez, Martha, Hart, Mark W., Kim, Ho-Cheol, Zhang, Ying

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  5. 5
    A Three-Terminal Approach to Developing Spin-Torque Written Magnetic Random Access Memory Cells

    A Three-Terminal Approach to Developing Spin-Torque Written Magnetic Random Access Memory Cells by Braganca, P.M., Katine, J.A., Emley, N.C., Mauri, D., Childress, J.R., Rice, P.M., Delenia, E., Ralph, D.C., Buhrman, R.A.

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  6. 6
    Patterning ∼ 20 nm half-pitch lines on silicon using a self-assembled organosilicate etch mask

    Patterning ∼ 20 nm half-pitch lines on silicon using a self-assembled organosilicate etch mask by Sundström, Linnea, Krupp, Leslie, Delenia, Eugene, Rettner, Charles, Sanchez, Martha, Hart, Mark W., Kim, Ho-Cheol, Zhang, Ying

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  7. 7
    Imaging Thin Films of Nanoporous Low-k Dielectrics: Comparison between Ultramicrotomy and Focused Ion Beam Preparations for Transmission Electron Microscopy

    Imaging Thin Films of Nanoporous Low-k Dielectrics: Comparison between Ultramicrotomy and Focused Ion Beam Preparations for Transmission Electron Microscopy by Thompson, Leslie E., Rice, Philip M., Delenia, Eugene, Lee, Victor Y., Brock, Phillip J., Magbitang, Teddie P., Dubois, Geraud, Volksen, Willi, Miller, Robert D., Kim, Ho-Cheol

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