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    Dependence of CMP-induced delamination on number of low-k dielectric films stacked

    Dependence of CMP-induced delamination on number of low-k dielectric films stacked by Leduc, Patrick, Farjot, Thierry, Savoye, Mylène, Demas, Anne-Cécile, Maitrejean, Sylvain, Passemard, Gérard

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