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Search Results - Deshmukh, V.G.I.
Search Results - Deshmukh, V.G.I.
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Nuclear spin relaxation in molten CdCdI 2 and ICdI 2 mixtures
by
Deshmukh, V.G.I.
,
Styles, G.A.
,
Seymour, E.F.W.
Published in
Physics letters. A
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Reactive ion etching of polyimide for multi-level resist and contact hole applications
by
Till, S.J.
,
Brown, A.G.
,
Deshmukh, V.G.I.
Published in
Microelectronic engineering
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Use of optical emission spectroscopy to study hexafluoroethane reactive ion beam etching of silicon in the presence of oxygen
by
COX, T. I
,
DESHMUKH, V. G. I
Published in
Applied physics letters
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A direct-write electron beam lithography process using multi-layer resists and its application to silicon-on-sapphire technology
by
Brown, A.G.
,
Mortimer, S.H.
,
Till, S.J.
,
Deshmukh, V.G.I.
Published in
Microelectronic engineering
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Focused ion beams for lithography and direct doping in VLSI device fabrication
by
Beale, M.I.J.
,
Broughton, C.
,
Deshmukh, V.G.I.
Published in
Microelectronic engineering
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Nuclear spin relaxation in molten CdCdI2 and ICdI2 mixtures
by
Deshmukh, V.G.I.
,
Styles, G.A.
,
Seymour, E.F.W.
Published in
Physics letters. A
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Nuclear spin relaxation in stoichiometric and thallium-doped thallous halide melts
by
Deshmukh, V.G.I.
,
Seymour, E.F.W.
,
Styles, G.A.
Published in
Physics letters. A
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Electrical and structural properties of pulse laser-annealed polycrystalline silicon films
by
Cox, T.I.
,
Deshmukh, V.G.I.
,
Hill, J.R.
,
Webber, H.C.
,
Chew, N.G.
,
Cullis, A.G.
Published in
IEEE transactions on electron devices
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Silicon microetching technology
by
Deshmukh, V.G.I
,
Cox, T.I
,
Benjamin, J.D
Published in
Physics in technology
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