A low valent metalorganic precursor for the growth of tungsten nitride thin films by atomic layer deposition by DEZELAH, Charles L, EL-KADRI, Oussama M, KUKLI, Kaupo, ARSTILA, Kai, BAIRD, Ronald J, JUN LU, NIINISTÖ, Lauri, WINTER, Charles H

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Atomic Layer Deposition of Ga 2 O 3 Films from a Dialkylamido-Based Precursor by Dezelah, Niinistö, Jaakko, Arstila, Kai, Niinistö, Lauri, Winter, Charles H.

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A Pyrazolate-Based Metalorganic Tantalum Precursor That Exhibits High Thermal Stability and Its Use in the Atomic Layer Deposition of Ta 2 O 5 by Dezelah, Wiedmann, Monika K., Mizohata, Kenichiro, Baird, Ronald J., Niinistö, Lauri, Winter, Charles H.

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Advanced cyclopentadienyl precursors for atomic layer deposition of ZrO2 thin films by NIINISTO, Jaakko, KUKLI, Kaupo, RITALA, Mikko, LESKELÄ, Markku, TAMM, Aile, PUTKONEN, Matti, DEZELAH, Charles L, NIINISTÖ, Lauri, JUN LU, FUQUAN SONG, WILLIAMS, Paul, HEYS, Peter N

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Preparation and characterization of molybdenum and tungsten nitride nanoparticles obtained by thermolysis of molecular precursors by DEZELAH, Charles L, EL-KADRI, Oussama M, HEEG, Mary Jane, WINTER, Charles H

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The growth of ErxGa2-xO3 films by atomic layer deposition from two different precursor systems by DEZELAH, Charles L, MYLLYMÄKI, Pia, PÄIVÄSAARI, Jani, ARSTILA, Kai, NIINISTÖ, Lauri, WINTER, Charles H

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The growth of Er x Ga 2−x O 3 films by atomic layer deposition from two different precursor systems by Dezelah, Charles L., Myllymäki, Pia, Päiväsaari, Jani, Arstila, Kai, Niinistö, Lauri, Winter, Charles H.

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Materials Design Through Chemical Control of Precursors by Winter, Charles H, El Kadri, Hani M, Dezelah, IV, Charles L

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