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Benchmarking 193 nm photoresists for etch resistance
by
Bakshi, V.
,
Smith, G.
,
Alzaben, T.
,
Beach, J.
,
Spurlock, K.
,
Berger, R.
,
Dorris, S.-T.L.
,
Pearson, S.
,
Holladay, D.
,
Woehl, J.
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Argon
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Chemical Technology
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Electronics Industry
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Engineering, Electrical & Electronic
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Engineering, Manufacturing
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Etching
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Plasma Applications
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Plasma Materials Processing
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Resists
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Silicon
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Thermal Resistance
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