Ferroelectricity of pristine Hf 0.5 Zr 0.5 O 2 films fabricated by atomic layer deposition by Chen 陈, Luqiu 璐秋, Zhang 张, Xiaoxu 晓旭, Feng 冯, Guangdi 光迪, Liu 刘, Yifei 逸飞, Hao 郝, Shenglan 胜兰, Zhu 朱, Qiuxiang 秋香, Feng 冯, Xiaoyu 晓钰, Qu 屈, Ke 可, Yang 杨, Zhenzhong 振中, Qi 祁, Yuanshen 原深, Ivry, Yachin, Dkhil, Brahim, Tian 田, Bobo 博博, Chu 褚, Junhao 君浩, Duan 段, Chungang 纯刚

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