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The study of GaAs reactive ion etching in Cl2/Ar
by
Dulkin, AE
,
Pyataev, VZ
,
Sokolova, NO
,
Moshkalyov, SA
,
Smirnov, AS
,
Frolov, KS
Published in
Vacuum
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III–V compound semiconductor reactive ion etching in chlorine and methane containing mixtures
by
Dulkin, A.E.
,
Moshkalyov, S.A.
,
Pyataev, V.Z.
,
Smirnov, A.S.
,
Frolov, K.S.
Published in
Microelectronic engineering
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The study of GaAs reactive ion etching in Cl 2/Ar
by
Dulkin, AE
,
Pyataev, VZ
,
Sokolova, NO
,
Moshkalyov, SA
,
Smirnov, AS
,
Frolov, KS
Published in
Vacuum
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