Mechanisms of arsenic segregation to the Ni{sub 2}Si/SiO{sub 2} interface during Ni{sub 2}Si formation by Pawlak, M.A., Janssens, T., Lauwers, A., Vantomme, A., Vandervorst, W., Maex, K., Kittl, J.A., IMEC, Kapeldreef 75, 3001 Leuven, IKS, Katholieke Universiteit Leuven, Celestijnenlaan 200 D, 3001 Leuven, E.E. Department Katholieke Universiteit Leuven and IMEC, Kapeldreef 75, 3001 Leuven, Affiliate at IMEC from Texas Instruments IMEC, Kapeldreef 75, 3001 Leuven

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