Engineering anisotropic magnetoresistance of Hall bars with interfacial organic layers by Park, Jun Hong, Ribeiro, Mario, Pham, Thi Kim Hang, Lee, Nyun Jong, Eom, Tai-woon, Jo, Junhyeon, Park, Seung-Young, Rhim, Sonny H., Nakamura, Kohji, Yoo, Jung-Woo, Kim, Tae Hee

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