DETECTION AND TRACKING OF MOVING OBJECTS WITH REAL-TIME ONBOARD VISION SYSTEM by Erokhin, D. Y., Feldman, A. B., Korepanov, S. E.

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Prevalence of and risk factors for resistance to second-line drugs in people with multidrug-resistant tuberculosis in eight countries: a prospective cohort study by Dalton, Tracy, Dr, Cegielski, Peter, MD, Akksilp, Somsak, MD, Asencios, Luis, MPH, Caoili, Janice Campos, MD, Cho, Sang-Nae, Prof, Erokhin, Vladislav V, MD, Ershova, Julia, PhD, Gler, Ma Tarcela, MD, Kazennyy, Boris Y, MD, Kim, Hee Jin, MD, Kliiman, Kai, MD, Kurbatova, Ekaterina, MD, Kvasnovsky, Charlotte, MD, Leimane, Vaira, MD, van der Walt, Martie, PhD, Via, Laura E, PhD, Volchenkov, Grigory V, MD, Yagui, Martin A, MD, Kang, Hyungseok, MD

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Sfmbt Co-purifies with Hangover and SWI/SNF-Remodelers in Drosophila melanogaster by Erokhin, M. M., Shidlovskii, Y. V., Lomaev, D. V., Georgiev, P. G., Chetverina, D. A.

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Reduction of transient diffusion from 1–5 keV Si+ ion implantation due to surface annihilation of interstitials by Agarwal, Aditya, Gossmann, H.-J., Eaglesham, D. J., Pelaz, L., Jacobson, D. C., Haynes, T. E., Erokhin, Yu. E.

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Interstitial defects in silicon from 1–5 keV Si+ ion implantation by Agarwal, Aditya, Haynes, Tony E., Eaglesham, David J., Gossmann, Hans-J., Jacobson, Dale C., Poate, John M., Erokhin, Yu. E.

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First lasing at the high-power free electron laser at Siberian center for photochemistry research by Antokhin, E.A, Akberdin, R.R, Arbuzov, V.S, Bokov, M.A, Bolotin, V.P, Burenkov, D.B, Bushuev, A.A, Veremeenko, V.F, Vinokurov, N.A, Vobly, P.D, Gavrilov, N.G, Gorniker, E.I, Gorchakov, K.M, Grigoryev, V.N, Gudkov, B.A, Davydov, A.V, Deichuli, O.I, Dementyev, E.N, Dovzhenko, B.A, Dubrovin, A.N, Evtushenko, Yu.A, Zagorodnikov, E.I, Zaigraeva, N.S, Zakutov, E.M, Erokhin, A.I, Kayran, D.A, Kiselev, O.B, Knyazev, B.A, Kozak, V.R, Kolmogorov, V.V, Kolobanov, E.I, Kondakov, A.A, Kondakova, N.L, Krutikhin, S.A, Kryuchkov, A.M, Kubarev, V.V, Kulipanov, G.N, Kuper, E.A, Kuptsov, I.V, Kurkin, G.Ya, Labutskaya, E.A, Leontyevskaya, L.G, Loskutov, V.Yu, Matveenko, A.N, Medvedev, L.E, Medvedko, A.S, Miginsky, S.V, Mironenko, L.A, Motygin, S.V, Oreshkov, A.D, Ovchar, V.K, Osipov, V.N, Persov, B.Z, Petrov, S.P, Petrov, V.M, Pilan, A.M, Poletaev, I.V, Polyanskiy, A.V, Popik, V.M, Popov, A.M, Rotov, E.A, Salikova, T.V, Sedliarov, I.K, Selivanov, P.A, Serednyakov, S.S, Skrinsky, A.N, Tararyshkin, S.V, Timoshina, L.A, Tribendis, A.G, Kholopov, M.A, Cherepanov, V.P, Shevchenko, O.A, Shteinke, A.R, Shubin, E.I, Scheglov, M.A

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Nsls-II Boster by Gurov, S.M., Akimov, A.V., Akimov, V.E., Anashin, V.V., Anchugov, O.V., Baranov, G.N., Batrakov, A.M., Belikov, O.V., Bekhtenev, E.A., Blum, E., Bulatov, A.V., Burenkov, D.B., Cheblakov, P.B., Chernyakin, A.D., Cheskidov, V.G., Churkin, I.N., Davidsavier, M., Derbenev, A.A., Erokhin, A.I., Fliller, R.P., Fulkerson, M., Gorchakov, K.M., Ganetis, G., Gao, F., Gurov, D.S., Hseuh, H., Hu, Y., Johanson, M., Kadyrov, R.A., Karnaev, S.E., Karpov, G.V., Kiselev, V.A., Kobets, V.V., Konstantinov, V.M., Kolmogorov, V.V., Korepanov, A.A., Kramer, S., Krasnov, A.A., Kremnev, A.A., Kuper, E.A., Kuzminykh, V.S., Levichev, E.B., Li, Y., Long, J.De, Makeev, A.V., Mamkin, V.R., Medvedko, A.S., Meshkov, O.I., Nefedov, N.B., Neyfeld, V.V., Okunev, I.N., Ozaki, S., Padrazo, D., Petrov, V.V., Petrichenkov, M.V., Philipchenko, A.V., Polyansky, A.V., Pureskin, D.N., Rakhimov, A.R., Rose, J., Ruvinskiy, S.I., Rybitskaya, T.V., Sazonov, N.V., Schegolev, L.M., Semenov, A.M., Semenov, E.P., Senkov, D.V., Serdakov, L.E., Serednyakov, S.S., Shaftan, T.V., Sharma, S., Shichkov, D.S., Shiyankov, S.V., Shvedov, D.A., Simonov, E.A., Singh, O., Sinyatkin, S.V., Smaluk, V.V., Sukhanov, A.V., Tian, Y., Tsukanova, L.A., Vakhrushev, R.V., Vobly, P.D., Utkin, A.V., Wang, G., Wahl, W., Willeke, F., Yaminov, K.R., Yong, H., Zhuravlev, A., Zuhoski, P.

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Using Multiple Implant Regions To Reduce Development Wafer Usage by Walther, S R, Falk, S, Mehta, S, Erokhin, Y, Nunan, P

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Advanced 65nm CMOS devices fabricated using ultra-low energy plasma doping by Walther, S., Lenoble, D., Lallement, F., Grouillet, A., Erokhin, Y., Singh, V., Testoni, A.

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The retreat of mountain glaciers since the Little Ice Age: A spatially explicit database by Marta, S, Azzoni, RS, Fugazza, D, Tielidze, L, Chand, P, Sieron, K, Almond, Peter, Ambrosini, R, Anthelme, F, Alviz Gazitúa, P, Bhambri, R, Bonin, A, Caccianiga, M, Cauvy-Fraunié, S, Lievano, JLC, Clague, J, Rapre, JAC, Dangles, O, Deline, P, Eger, A, Encarnación, RC, Erokhin, S, Franzetti, A, Gielly, L, Gili, F, Gobbi, M, Guerrieri, A, Hågvar, S, Khedim, N, Kinyanjui, R, Messager, E, Morales-Martínez, MA, Peyre, G, Pittino, F, Poulenard, J, Seppi, R, Sharma, MC, Urseitova, N, Weissling, B, Yang, Y, Zaginaev, V, Zimmer, A, Diolaiuti, GA, Rabatel, A, Ficetola, GF

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Detection of rifampicin-resistant Mycobacterium tuberculosis strains by hybridization and polymerase chain reaction on a specialized TB-microchip by Mikhailovich, V M, Lapa, S A, Gryadunov, D A, Strizhkov, B N, Sobolev, A Y, Skotnikova, O I, Irtuganova, O A, Moroz, A M, Litvinov, V I, Shipina, L K, Vladimirskii, M A, Chernousova, L N, Erokhin, V V, Mirzabekov, A D

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YBCO and BSCCO thin films prepared by wet MOCVD by Gorbenko, O. Yu, Fuflyigin, V. N., Erokhin, Yu. Yu, Graboy, I. E., Kaul, A. R., Tretyakov, Yu. D., Wahl, G., Klippe, L.

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Ga delta-doping layers in silicon by ZAGWIJN, P. M, EROKHIN, Y. N, SLIJKERMAN, W. F. J, VAN DER VEEN, J. F, VAN DE WALLE, G. F. A, GRAVESTEIJN, D. J, VAN GORKUM, A. A

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Jumber Lominadze (In Honor of His 70th Birthday) by Avrorin, É.N., Balebanov, V. M., Boyarchuk, A. A., Velikhov, E. P., Galeev, A. A., Golant, V. E., Erokhin, N. S., Zheleznyakov, V. V., Zelenyĭ, L. M., Karas’, V. I., Kardashev, N. S., Krokhin, O. N., Kurdyumov, S. P., Litvak, A. G., Managadze, G. G., Mikhaĭlovskiĭ, A. B., Moiseev, S. S., Oraevskiĭ, V. N., Pokhotelov, O. A., Rukhadze, A. A., Sagdeev, R. Z., Stepanov, K. N., Faĭnberg, Ya. B., Chkhetiani, O. G., Shafranov, V. D.

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Boron-enhanced-diffusion of boron: The limiting factor for ultra-shallow junctions by Agarwal, A., Eaglesham, D.J., Gossmann, H.-J., Pelaz, L., Herner, S.B., Jacobson, D.C., Haynes, T.E., Erokhin, Y., Simonton, R.

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Modeling of ultra-low energy boron implantation in silicon by Hobler, G., Vuong, H.-H., Bevk, J., Agarwal, A., Gossmann, H.-J., Jacobson, D.C., Foad, M., Murrell, A., Erokhin, Y.

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Extended defects in silicon by MeV B++ implantation in different 8" Cz-Si wafers by Pech, R., Huber, D., Brunner, J., Rubin, L., Erokhin, Y., Funk, K., Morris, W., Stutzmann, M.

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UV curing and photoresist outgassing in high energy implantation by Jones, M.A., Erokhin, Y., Horsky, T., Insalaco, L., Whiteside, D., Slater, S., Buffat, S., Kickel, B., Parrill, T., Jie Jie Xu

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YBCO and BSCCO thin films prepared by wet MOCVD by GORBENKO, O. YU, FUFLYIGIN, V. N, EROKHIN, YU. YU, GRABOY, I. E, KAUL, A. R, TRETYAKOV, YU. D, WAHL, G, KLIPPE, L

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