Search Results - Erokhin, Yu.N.

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    Recombination enhanced suppression of deep trap accumulation in silicon during He + ion implantation

    Recombination enhanced suppression of deep trap accumulation in silicon during He + ion implantation by Erokhin, Yu.N., Ravi, J., White, C.W., Rozgonyi, G.A.

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    Mesotaxy by nickel diffusion into a buried amorphous silicon layer

    Mesotaxy by nickel diffusion into a buried amorphous silicon layer by Erokhin, Yu.N., Grötzschel, R., Oktyabrsky, S.R., Roorda, S., Sinke, W., Vyatkin, A.F.

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