Search Results - Eun Hae Han

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  1. 801
    p-d hydridization of the valence bands of AgxCu1-xGaSe2 compounds

    p-d hydridization of the valence bands of AgxCu1-xGaSe2 compounds by PARK, S, SUN KOO LEE, JAE YOUNG LEE, JAE-EUN KIM, HAE YONG PARK, HONG-LEE PARK, HAN-JO LIM, WHA-TEK KIM

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  2. 802
    Cytogenetic abnormality involving 8p11.2 in T-lymphoblastic lymphoma: report of a new case

    Cytogenetic abnormality involving 8p11.2 in T-lymphoblastic lymphoma: report of a new case by Bae, Sook Young, Kim, Jang Su, Han, Eun Ae, Lee, Hae Jin, Ryeu, Bung Jun, Lee, Kap No, Lee, Chang Kyu, Cho, Yunjung, Kim, Young Kee, Yoon, Soo-Young, Lim, Chae Seung, Choi, Chul Won, Kim, Woon Young

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  3. 803
    Mixed exocrine and endocrine carcinoma in the stomach: a case report

    Mixed exocrine and endocrine carcinoma in the stomach: a case report by Lee, Han Hong, Jung, Chan Kwon, Jung, Eun Sun, Song, Kyo Young, Jeon, Hae Myung, Park, Cho Hyun

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  4. 804
    p-d hybridization of the valence bands of AgxCu1-xGaSe2 compounds

    p-d hybridization of the valence bands of AgxCu1-xGaSe2 compounds by Park, Sungil, Lee, Sun Koo, Lee, Jae Young, Kim, Jae-Eun, Park, Hae Yong, Park, Hong-Lee, Lim, Han-jo, Kim, Wha-Tek

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  5. 805
    Cytogenetic abnormality involving 8p11.2 in T-lymphoblastic lymphoma: report of a new case

    Cytogenetic abnormality involving 8p11.2 in T-lymphoblastic lymphoma: report of a new case by Bae, Sook Young, Kim, Jang Su, Han, Eun Ae, Lee, Hae Jin, Ryeu, Bung Jun, Lee, Kap No, Lee, Chang Kyu, Cho, Yunjung, Kim, Young Kee, Yoon, Soo-Young, Lim, Chae Seung, Choi, Chul Won, Kim, Woon Young

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  6. 806
    Observer-based fuzzy H/sup /spl infin// control for uncertain nonlinear systems with time delays

    Observer-based fuzzy H/sup /spl infin// control for uncertain nonlinear systems with time delays by Kap Rai Lee, Jong Hae Kim, Eun Tae Jeung, Han O Yun, Hong Bae Park

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  7. 807
    Bioeuqivalence Study of Nabumetone Tablets in Man

    Bioeuqivalence Study of Nabumetone Tablets in Man by Lee, Young-Joo, Jang, Eun-Ju, Lee, Jeong-Uk, Han, Yong-Hae, Chung, Suk-Jae, Lee, Min-Hwa, Shim, Chang-Koo

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  8. 808
    Characteristics of ALD HfSiOx using new Si precursors for gate dielectric applications

    Characteristics of ALD HfSiOx using new Si precursors for gate dielectric applications by KIM, Yun-Seok, HA JIN LIM, CHUNG, Youngsu, HAE YOUNG KIM, NAM KYU LEE, RAMANATHAN, Sasangan, SEIDEL, Tom, BOLESLAWSKI, Marek, IRVINE, Geoff, KIM, Byung-Ki, LEE, Hyeung-Ho, KANG, Ho-Kyu, JUNG, Hyung-Suk, LEE, Jong-Ho, PARK, Jae-Eun, SUNG KEE HAN, JUNG HYOUNG LEE, DOH, Seok-Joo, JONG PYO KIM, NAE IN LEE

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  9. 809
    Characteristics of ALD HfSiO/sub x/ using new Si precursors for gate dielectric applications

    Characteristics of ALD HfSiO/sub x/ using new Si precursors for gate dielectric applications by Yun-Seok Kim, Ha Jin Lim, Hyung-Suk Jung, Jong-Ho Lee, Jae-Eun Park, Sung Kee Han, Jung Hyoung Lee, Seok-Joo Doh, Jong Pyo Kim, Nae In Lee, Ho-Kyu Kang, Youngsu Chung, Hae Young Kim, Nam Kyu Lee, Ramanathan, S., Seidel, T., Boleslawski, M., Irvine, G., Byung-Ki Kim, Hyeung-Ho Lee

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