Search Results - Farnham, W.B.

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    Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm

    Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm by Feiring, A.E., Crawford, M.K., Farnham, W.B., Feldman, J., French, R.H., Leffew, K.W., Petrov, V.A., Schadt, F.L., Wheland, R.C., Zumsteg, F.C.

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    Pentacoordinate cyanosiliconates

    Pentacoordinate cyanosiliconates by Dixon, David A, Hertler, Walter R, Chase, D. Bruce, Farnham, William B, Davidson, Fredric

    Published in Inorganic chemistry
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