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Impact of process factors on the performance of hole array metallic filters
by
Girard-Desprolet, Romain
,
Lhostis, Sandrine
,
Beylier, Charlotte
,
Farys, Vincent
,
Vitrant, Guy
,
Boutami, Salim
Published in
Applied physics. A, Materials science & processing
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Highly sensitive detection technique of buried defects in extreme ultraviolet masks using at-wavelength scanning dark-field microscopy
by
Farys, V.
,
Schiavone, P.
,
Polack, F.
,
Idir, M.
,
Bertolo, M.
,
Bianco, A.
,
La Rosa, S.
,
Cautero, G.
,
Vannuffel, C.
,
Quesnel, E.
,
Muffato, V.
Published in
Applied physics letters
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Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blanks
by
Farys, Vincent
,
Charpin-Nicolle, Christelle
,
Richard, Marieke
,
Robic, Jean-Yves
,
Muffato, Viviane
,
Quesnel, Etienne
,
Postnikov, Sergeï
,
Schiavone, Patrick
,
Besacier, Maxime
,
Smaali, Rafik
,
Naulleau, Patrick
Published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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Measurement of residual thickness using scatterometry
by
Fuard, David
,
Perret, Corinne
,
Farys, Vincent
,
Gourgon, Cécile
,
Schiavone, Patrick
Published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blanks
by
Farys, Vincent
,
Charpin-Nicolle, Christelle
,
Richard, Marieke
,
Robic, Jean-Yves
,
Muffato, Viviane
,
Quesnel, Etienne
,
Postnikov, Sergeï
,
Schiavone, Patrick
,
Besacier, Maxime
,
Smaali, Rafik
,
Naulleau, Patrick
Published in
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
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