Search Results - Feich, S.B.

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    Direct comparison of electrical performance of 0.1-/spl mu/m pMOSFETs doped by plasma doping or low energy ion implantation

    Direct comparison of electrical performance of 0.1-/spl mu/m pMOSFETs doped by plasma doping or low energy ion implantation by Lenoble, D., Grouillet, A., Arnaud, F., Haond, M., Feich, S.B., Fang, Z., Walther, S., Liebert, R.B.

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