Search Results - Foggiato, John

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  1. 1
    Optimizing the formation of nickel silicide

    Optimizing the formation of nickel silicide by Foggiato, John, Yoo, Woo Sik, Ouaknine, Michel, Murakami, Tomomi, Fukada, Takahashi

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  2. 2
    Role of new materials in enhancing productivity of semiconductor manufacturing equipment

    Role of new materials in enhancing productivity of semiconductor manufacturing equipment by Foggiato, J.

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  3. 3
    Millisecond flash annealing: Applications for USJ formation and optimization of device electrical characteristics

    Millisecond flash annealing: Applications for USJ formation and optimization of device electrical characteristics by Foggiato, John, Yoo, Woo Sik

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  4. 4
    Etching Mechanisms of Fluoroelastomer Seals and Performance Characteristics

    Etching Mechanisms of Fluoroelastomer Seals and Performance Characteristics by Alexander, W.B., Foggiato, J.

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  5. 5
    New Elastomer Materials Provide Enhanced Longevity and Sealing Performance for Semiconductor Manufacturing Equipment

    New Elastomer Materials Provide Enhanced Longevity and Sealing Performance for Semiconductor Manufacturing Equipment by Foggiato, J., Alexander, B.

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  6. 6
    Optimization of semiconductor manufacturing equipment seals for enhanced performance

    Optimization of semiconductor manufacturing equipment seals for enhanced performance by Foggiato, J., Thrash, A., Freerks, F., Al-Saleem, F.

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  7. 7
    Ultra shallow junction formation by flash annealing : The challenges ahead

    Ultra shallow junction formation by flash annealing : The challenges ahead by FOGGIATO, John, WOO SIK YOO

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  8. 8
    Design of a hot wall-based low temperature annealing system and its process applications

    Design of a hot wall-based low temperature annealing system and its process applications by Woo Sik Yoo, Fukada, T., Murakami, T., Kitaek Kang, Foggiato, J.

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  9. 9
    Electrical activation and dopant diffusion of heavily boron implanted silicon

    Electrical activation and dopant diffusion of heavily boron implanted silicon by HAMISH, Justin, CARLSON, Chris, FOGGIATO, John, KANG, Kitaek, WOO SIK YOO

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