Search Results - Frystak, D. C.

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  1. 1
    Electrical Evaluation of Wet and Dry Cleaning Procedures for Silicon Device Fabrication

    Electrical Evaluation of Wet and Dry Cleaning Procedures for Silicon Device Fabrication by Ruzyllo, J., Hoff, A. M., Frystak, D. C., Hossain, S. D.

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  2. 2
    Control of interfacial oxide using a novel cluster tool technology

    Control of interfacial oxide using a novel cluster tool technology by Frystak, D.C., Albone, J., Rumaine, P.

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  3. 3
    An investigation of moisture and oxygen contamination in a vacuum loadlock single-wafer cluster tool

    An investigation of moisture and oxygen contamination in a vacuum loadlock single-wafer cluster tool by Wise, R.L., Tapp, F.L., Frystak, D.C., Fowler, B.W.

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  4. 4
    Quantitative inelastic tunneling spectroscopy in the silicon metal-oxide-semiconductor system

    Quantitative inelastic tunneling spectroscopy in the silicon metal-oxide-semiconductor system by Lye, Whye-Kei, Hasegawa, Eiji, Ma, Tso-Ping, Barker, Richard C., Hu, Yin, Kuehne, John, Frystak, David

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  5. 5
    Low-power ferroelectric random access memory embedded in 180nm analog friendly CMOS technology

    Low-power ferroelectric random access memory embedded in 180nm analog friendly CMOS technology by Udayakumar, K. R., San, T., Rodriguez, J., Chevacharoenkul, S., Frystak, D., Rodriguez-Latorre, J., Zhou, C., Ball, M., Ndai, P., Madan, S., McAdams, H., Summerfelt, S., Moise, T.

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  6. 6
    Sub-100 nm gate length metal gate NMOS transistors fabricated by a replacement gate process

    Sub-100 nm gate length metal gate NMOS transistors fabricated by a replacement gate process by Chatterjee, A., Chapman, R.A., Dixit, G., Kuehne, J., Hattangady, S., Yang, H., Brown, G.A., Aggarwal, R., Erdogan, U., He, Q., Hanratty, M., Rogers, D., Murtaza, S., Fang, S.J., Kraft, R., Rotondaro, A.L.P., Hu, J.C., Terry, M., Lee, W., Fernando, C., Konecni, A., Wells, G., Frystak, D., Bowen, C., Rodder, M., Chen, I.-C.

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