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Surface treatment against bromine defectivity in plasma etch reactor
by
Yoann, Goasduff
,
Nguyen, Marylaine
,
Patrice, Laurens
,
Distefano, Giuseppe
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Comparison study between optical emission spectroscopy and x-ray photoelectron spectroscopy techniques during process etch plasma
by
Rizquez, Maria
,
Roussy, Agnès
,
James, Anthony
,
Pinaton, Jacques
,
Goasduff, Yoann
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