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Comparison of MOCVD- and ALD-Deposited HfZrO4 Gate Dielectrics for 32-nm High-Performance Logic SOI CMOS Technologies
by
KELWING, Torben
,
NAUMANN, Andreas
,
HANSCH, Walter
,
TRENTZSCH, Martin
,
TRUI, Bernhard
,
HERRMANN, Lutz
,
MUTAS, Sergej
,
GRAETSCH, Falk
,
CARTER, Rick
,
STEPHAN, Rolf
,
KÜCHER, Peter
Published in
IEEE electron device letters
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Comparison of MOCVD- and ALD-Deposited [Formula Omitted] Gate Dielectrics for 32-nm High-Performance Logic SOI CMOS Technologies
by
Kelwing, Torben
,
Naumann, Andreas
,
Trentzsch, Martin
,
Trui, Bernhard
,
Herrmann, Lutz
,
Mutas, Sergej
,
Graetsch, Falk
,
Carter, Rick
,
Stephan, Rolf
,
Kucher, Peter
,
Hansch, Walter
Published in
IEEE electron device letters
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Comparison of MOCVD- and ALD-Deposited \hbox Gate Dielectrics for 32-nm High-Performance Logic SOI CMOS Technologies
by
Kelwing, Torben
,
Naumann, Andreas
,
Trentzsch, Martin
,
Trui, Bernhard
,
Herrmann, Lutz
,
Mutas, Sergej
,
Graetsch, Falk
,
Carter, Rick
,
Stephan, Rolf
,
Kücher, Peter
,
Hansch, Walter
Published in
IEEE electron device letters
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Comparison of MOCVD- and ALD-Deposited hbox HfZrO 4 Gate Dielectrics for 32-nm High-Performance Logic SOI CMOS Technologies
by
Kelwing, Torben
,
Naumann, Andreas
,
Trentzsch, Martin
,
Trui, Bernhard
,
Herrmann, Lutz
,
Mutas, Sergej
,
Graetsch, Falk
,
Carter, Rick
,
Stephan, Rolf
,
Kucher, Peter
,
Hansch, Walter
Published in
IEEE electron device letters
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Physical and Electrical Properties of MOCVD and ALD Deposited HfZrO 4 Gate Dielectrics for 32nm CMOS High Performance Logic SOI Technologies
by
Kelwing, Torben
,
Mutas, Sergej
,
Trentzsch, Martin
,
Naumann, Andreas
,
Trui, Bernhard
,
Herrmann, Lutz
,
Graetsch, Falk
,
Klein, Christoph
,
Wilde, Lutz
,
Ohsiek, Susanne
,
Weisheit, Martin
,
Peeva, Anita
,
Richter, Inka
,
Prinz, Hartmut
,
Wuerfel, Alexander
,
Carter, Rick
,
Stephan, Rolf
,
Kücher, Peter
,
Hansch, Walter
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Ultrathin plasma nitrided oxide gate dielectrics for sub-100 nm generation CMOS technology
by
JEON, Joong
,
YEH, Ping
,
OGLE, Bob
,
EN, Bill
,
WIECZOREK, Karsten
,
GRAETSCH, Falk
,
BERNARD, Joffre
,
KIM, Hyeon S
,
IBOK, Effiong
,
OLSEN, Chris
,
ZHAO, Richard
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