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Roughness analysis of lithographically produced nanostructures: off-line measurement and scaling analysis
by
Patsis, George P.
,
Constantoudis, Vasilios
,
Tserepi, Angeliki
,
Gogolides, Evangelos
,
Grozev, Grozdan
,
Hoffmann, Thomas
Published in
Microelectronic engineering
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Design Considerations for Anti-reflection Layer in Thin Imaging System
by
Malik, Sanjay
,
De, Binod
,
Biafore, John
,
Spaziano, Greg
,
Sarubbi, Tom
,
Dilocker, Stephanie
,
Bowden, Murrae
,
Reybrouc, Mario
,
Grozev, Grozdan
,
Driessche, Veerle van
,
Tzviatkov, Plamen
Published in
Journal of Photopolymer Science and Technology
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Optically enhanced i-line lithography for 0.3-micrometer random logic applications
by
Yen, Anthony
,
Tzviatkov, Plamen
,
Grozev, Grozdan
Published in
Solid state technology
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