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Evaluation of direct patternable inorganic spin-on hard mask materials using electron beam lithography
by
Thrun, Xaver
,
Choi, Kang-Hoon
,
Freitag, Martin
,
Grenville, Andrew
,
Gutsch, Manuela
,
Hohle, Christoph
,
Stowers, Jason K.
,
Bartha, Johann W.
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Microelectronic engineering
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15days electron beam exposure for manufacturing of large area silicon based NIL master
by
Thrun, Xaver
,
Choi, Kang-Hoon
,
Freitag, Martin
,
Gutsch, Manuela
,
Hohle, Christoph
,
Paul, Jan
,
Rudolph, Matthias
,
Steidel, Katja
Published in
Microelectronic engineering
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15 days electron beam exposure for manufacturing of large area silicon based NIL master
by
Thrun, X
,
Choi, K-H
,
Freitag, M
,
Gutsch, M
,
Hohle, C
,
Paul, J
,
Rudolph, M
,
Steidel, K
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Microelectronic engineering
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Variable-shaped e-beam lithography enabling process development for future copper damascene technology
by
Jaschinsky, Philipp
,
Erben, Jens-Wolfram
,
Choi, Kang-Hoon
,
Schulze, Knut
,
Gutsch, Manuela
,
Blaschta, Frieder
,
Freitag, Martin
,
Schulz, Stefan E.
,
Steidel, Katja
,
Hohle, Christoph
,
Gessner, Thomas
,
Kuecher, Peter
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Microelectronic engineering
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15 days electron beam exposure for manufacturing of large area silicon based NIL master : Nanolithography 2012
by
THRUN, Xaver
,
CHOI, Kang-Hoon
,
FREITAG, Martin
,
GUTSCH, Manuela
,
HOHLE, Christoph
,
PAUL, Jan
,
RUDOLPH, Matthias
,
STEIDEL, Katja
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High-density capacitors for SiP and SoC applications based on three-dimensional integrated metal-isolator-metal structures
by
Weinreich, Wenke
,
Rudolph, Matthias
,
Koch, Johannes
,
Paul, Jan
,
Seidel, Konrad
,
Riedel, Stefan
,
Sundqvist, Jonas
,
Steidel, Katja
,
Gutsch, Manuela
,
Beyer, Volkhard
,
Hohle, Christoph
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