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Alleviating electromigration through re-engineering the interface between Cu & dielectric-diffusion-barrier in 90 nm Cu/SiOC (k=2.9) device
by
Young Jin Wee
,
Soo Geun Lee
,
Won Sang Song
,
Kyoung-Woo Lee
,
Nam Hyung Lee
,
Ja Eung Ku
,
Ki-Kwan Park
,
Seung Jin Lee
,
Jae Hak Kim
,
Joo Hyuk Chung
,
Hong Jae Shin
,
Sang Rok Hah
,
Ho-Kyu Kang
,
Gwang Pyuk Suh
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Conference Proceeding
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Conference Proceedings
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Chemicals
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Current Density
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Dielectric Devices
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Electromigration
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Etching
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Helium
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Moisture
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Nitrogen
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Silicon Carbide
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Silicon Compounds
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Ieee Electronic Library (Iel) Conference Proceedings
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