Search Results - Han, Deoksu

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    Zeta potential-tunable silica abrasives and fluorinated surfactants in chemical mechanical polishing slurries

    Zeta potential-tunable silica abrasives and fluorinated surfactants in chemical mechanical polishing slurries by Hong, Seungchul, Han, Deoksu, Jang, Keon-Soo

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    Influence of abrasive morphology and size dispersity of Cu barrier metal slurry on removal rates and wafer surface quality in chemical mechanical planarization

    Influence of abrasive morphology and size dispersity of Cu barrier metal slurry on removal rates and wafer surface quality in chemical mechanical planarization by Hong, Seungchul, Han, Deoksu, Kwon, Jangkuk, Kim, Sung Jun, Lee, Seong Jae, Jang, Keon-Soo

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