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Simultaneous diffusion of Si and Ge in isotopically controlled Si sub(1-xGe) sub(x) heterostructures
by
Kube, R
,
Bracht, H
,
Hansen, JLundsgaard
,
Larsen, ANylandsted
,
Haller, EE
,
Paul, S
,
Lerch, W
Published in
Materials science in semiconductor processing
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Piezoresistance of silicon and strained Si sub(0.9)Ge sub(0.1)
by
Richter, J
,
Hansen, O
,
Larsen, ANylandsted
,
Hansen, JLundsgaard
,
Eriksen, G F
,
Thomsen, E V
Published in
Sensors and actuators. A. Physical.
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Materials Science In Semiconductor Processing
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Sensors And Actuators. A. Physical.
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Silicon
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Activation
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Coefficients
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Diffusion
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Diffusion Coefficient
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Doping
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Germanium
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Mechanical Systems
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Microelectromechanical Systems
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Semiconductors
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Silicon Germanides
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Silicon Substrates
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Sciencedirect Journals
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Sciencedirect Physical & Analytical Chemistry Backfile
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