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  1. 141
    Construction of surfaces of general type from elliptic surfaces via Q-Gorenstein smoothing

    Construction of surfaces of general type from elliptic surfaces via Q-Gorenstein smoothing by JongHae Keum, Lee, Yongnam, Park, Heesang

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  2. 142
    Resist profile characteristics caused by photoelectron and Auger electron blur at the resist–tungsten substrate interface in 100 nm proximity x-ray lithography

    Resist profile characteristics caused by photoelectron and Auger electron blur at the resist–tungsten substrate interface in 100 nm proximity x-ray lithography by Seo, Younghun, Lee, Changhwan, Seo, Yongduk, Kim, Ohyun, Noh, Hyunpil, Kim, Heesang

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