Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high-k materials in microelectronic devices. A carbon-free precursor for the synthesis of haf... by Smith, Ryan C., Ma, Tiezhong, Hoilien, Noel, Tsung, Lancy Y., Bevan, Malcolm J., Colombo, Luigi, Roberts, Jeffrey, Campbell, Stephen A., Gladfelter, Wayne L.

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Low Temperature Chemical Vapor Deposition of ZrO[sub 2] on Si(100) Using Anhydrous Zirconium (IV) Nitrate by Smith, Ryan C., Hoilien, Noel, Taylor, Charles J., Ma, Tiezhong, Campbell, Stephen A., Roberts, Jeffrey T., Copel, Matthew, Buchanan, D. A., Gribelyuk, Michael, Gladfelter, Wayne L.

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Group IVB metal oxides high permittivity gate insulators deposited from anhydrous metal nitrates by Tiezhong Ma, Campbell, S.A., Smith, R., Hoilien, N., Boyong He, Gladfelter, W.L., Hobbs, C., Buchanan, D., Taylor, C., Gribelyuk, M., Tiner, M., Coppel, M., Jang Jung Lee

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Combinatorial Chemical Vapor Deposition of Metal Dioxides Using Anhydrous Metal Nitrates by Smith, Ryan C, Hoilien, Noel, Roberts, Jeff, Campbell, Stephen A, Gladfelter, Wayne L

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Combinatorial Chemical Vapor Deposition. Achieving Compositional Spreads of Titanium, Tin, and Hafnium Oxides by Balancing Reactor Fluid Dynamics and Deposition Kinetics by Smith, Ryan C, Hoilien, Noel, Chien, Jimmy, Campbell, Stephen A, Roberts, Jeffrey T, Gladfelter, Wayne L

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Low temperature chemical vapor deposition of ZrO2 on Si(100) using anhydrous zirconium(V) nitrate by SMITH, Ryan C, HOILIEN, Noel, TAYLOR, Charles J, TIEZHONG MA, CAMPBELL, Stephen A, ROBERTS, Jeffrey T, COPEL, Matthew, BUCHANAN, D. A, GRIBELYUK, Michael, GLADFELTER, Wayne L

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