Search Results - Honcik, C.

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    The effect of HF processing on gate oxide degradation in aggressive poly buffered LOCOS isolation

    The effect of HF processing on gate oxide degradation in aggressive poly buffered LOCOS isolation by Cox, K., Chonko, M., Honcik, C., VanDyke, S.

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  2. 2
    Characterization and elimination of trench dislocations

    Characterization and elimination of trench dislocations by Damiano, J., Subramanian, C.K., Gibson, M., Feng, Y.-S., Zeng, L., Sebek, J., Deeters, E., Feng, C., McNelly, T., Blackwell, M., Nguyen, H., Tian, H., Scott, J., Zaman, J., Honcik, C., Miscione, M., Cox, K., Hayden, J.

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