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  1. 21
    Study of Selective Dry Etching Effects of 15-Cycle Si 0.7 Ge 0.3 /Si Multilayer Structure in Gate-All-Around Transistor Process

    Study of Selective Dry Etching Effects of 15-Cycle Si 0.7 Ge 0.3 /Si Multilayer Structure in Gate-All-Around Transistor Process by Liu, Enxu, Li, Junjie, Zhou, Na, Chen, Rui, Shao, Hua, Gao, Jianfeng, Zhang, Qingzhu, Kong, Zhenzhen, Lin, Hongxiao, Zhang, Chenchen, Lai, Panpan, Yang, Chaoran, Liu, Yang, Wang, Guilei, Zhao, Chao, Yang, Tao, Yin, Huaxiang, Li, Junfeng, Luo, Jun, Wang, Wenwu

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  2. 22
    Study of Selective Dry Etching Effects of 15-Cycle Si[sub.0.7]Ge[sub.0.3]/Si Multilayer Structure in Gate-All-Around Transistor Process

    Study of Selective Dry Etching Effects of 15-Cycle Si[sub.0.7]Ge[sub.0.3]/Si Multilayer Structure in Gate-All-Around Transistor Process by Liu, Enxu, Li, Junjie, Zhou, Na, Chen, Rui, Shao, Hua, Gao, Jianfeng, Zhang, Qingzhu, Kong, Zhenzhen, Lin, Hongxiao, Zhang, Chenchen, Lai, Panpan, Yang, Chaoran, Liu, Yang, Wang, Guilei, Zhao, Chao, Yang, Tao, Yin, Huaxiang, Li, Junfeng, Luo, Jun, Wang, Wenwu

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