Search Results - Horsky, Thomas N

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  1. 1
    N- and P-Type Cluster Source

    N- and P-Type Cluster Source by Horsky, Thomas N., Hahto, Sami K., McIntyre, Edward K., Sacco, George P. Jr

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  2. 2
    Boron Beam Performance and in-situ Cleaning of the ClusterIon(R) Source

    Boron Beam Performance and in-situ Cleaning of the ClusterIon(R) Source by Horsky, Thomas N, Gilchrist, Glen F R, Milgate III, Robert W

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  3. 3
    Universal Ion SourceTM for Cluster and Monomer Implantation

    Universal Ion SourceTM for Cluster and Monomer Implantation by Horsky, Thomas N

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  4. 4
    Optimization of ClusterCarbon™ process parameters for strained Si lattice

    Optimization of ClusterCarbon™ process parameters for strained Si lattice by Sekar, Karuppanan, Krull, Wade A., Horsky, Thomas N., Feudel, Thomas, Krüger, Christian, Flachowsky, Stefan, Ostermay, Ina

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  5. 5
    Optimization of ClusterCarbonTM process parameters for strained Si lattice

    Optimization of ClusterCarbonTM process parameters for strained Si lattice by Sekar, Karuppanan, Krull, Wade A, Horsky, Thomas N, Feudel, Thomas, Kruger, Christian, Flachowsky, Stefan, Ostermay, Ina

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  6. 6
    Indirectly heated cathode arc discharge source for ion implantation of semiconductors

    Indirectly heated cathode arc discharge source for ion implantation of semiconductors by Horsky, Thomas N.

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  7. 7
    Indirectly heated cathode arc discharge source for ion implantation of semiconductors

    Indirectly heated cathode arc discharge source for ion implantation of semiconductors by Horsky, Thomas N.

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  8. 8
    Photoresist outgassing in high energy and high current ion implantation

    Photoresist outgassing in high energy and high current ion implantation by Horsky, T.N.

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  9. 9
    Charge-transfer-plate spatial light modulators

    Charge-transfer-plate spatial light modulators by Warde, C, Schiller, C M, Bounds, J, Horsky, T N, Melnik, G, Dillon, R

    Published in Applied optics (2004)
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  10. 10
    Electron-beam-addressed membrane mirror light modulator for projection display

    Electron-beam-addressed membrane mirror light modulator for projection display by Horsky, T N, Schiller, C M, Genetti, G J, Tsakiris, T N, O'Mara, D M, Jurgilewicz, R, Lee, S D, Warde, C

    Published in Applied optics (2004)
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  11. 11
    Evaluation of electrode materials for ion implanters

    Evaluation of electrode materials for ion implanters by Vanderberg, B.H., Perel, A.S., Horsky, T.N.

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  12. 12
    Cluster Ion Implantation for beyond 45nm node novel device applications

    Cluster Ion Implantation for beyond 45nm node novel device applications by Tanjyo, M., Nagayama, T., Hamamoto, N., Umisedo, S., Koga, Y., Maehara, N., Matsumoto, T., Nagai, N., Ootsuka, F., Katakami, A., Shirai, K., Watanabe, T., Nakata, H., Kitajima, M., Aoyama, T., Eimori, T., Nara, Y., Ohji, Y., Saker, K., Krull, W., Jacobson, D., Horsky, T.

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