Study of Base Additives for Use in a Single Layer 193nm Resist Based Upon Poly(norbornene/maleic anhydride/acrylic acid/tert-butyl Acrylate) by Houlihan, F.M., Person, D., Rushkin, I., Dimov, O., Reichmanis, E., Nalamasu, O.

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A Commercially Viable 193 nm Single Layer Resist Platform by Houlihan, F.M., Wallow, T., Timko, A., Neria, E., Hutton, R., Cirelli, R., Kometani, J. M., Nalamasu, O., Reichmanis, E.

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Retrospective of work at Bell Laboratories on the effect of fluorine substitution on the properties of photoacid generators by Houlihan, F.M., Nalamasu, O., Reichmanis, E.

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A Commercially Viable 193nm Single Layer Resist Platform by Houlihan, F.M., Wallow, T., Timko, A., Neria, E., Hutton, R., Cirelli, R., Kometani, J. M., Nalamasu, O., Reichmanis, E.

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Fundamental studies of dissolution inhibition in poly(norbornene-alt-maleic anhydride) based resins by Houlihan, F.M., Dabbagh, G., Rushkin, I., Hutton, R., Bolan, K., Reichmanis, E., Nalamasu, O., Yan, Z., Reiser, A.

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Revolutionary and evolutionary resist design concepts for 193 nm lithography by Nalamasu, O., Wallow, T.I., Reichmanis, E., Novembre, A.E., Houlihan, F.M., Dabbagh, G., Mixon, D.A., Hutton, R.S., Timko, A.G., Wood, O.R., Cirelli, R.A.

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Fundamental Studies of the Effects of Photo-additive Structure on Resist Outgassing by Houlihan, F. M., Rushkin, I. L., Hutton, R. S., Timko, A. G., Reichmanis, E., Nalamasu, O., Gabor, A. H., Medina, A. N., Malik, S., Neiser, M., Kunz, R.R., Downs, D. K.

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