Search Results - Hourd, Andrew C

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  1. 1
    Nanosecond pulsed laser blackening of copper

    Nanosecond pulsed laser blackening of copper by Tang, Guang, Hourd, Andrew C., Abdolvand, Amin

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  2. 2
    Inkjet printing of high-concentration particle-free platinum inks

    Inkjet printing of high-concentration particle-free platinum inks by Grant, Timothy D., Hourd, Andrew C., Zolotovskaya, Svetlana, Lowe, John B., Rothwell, Rosemary J., Jones, Thomas D.A., Abdolvand, Amin

    Published in Materials & design
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  3. 3
    Plasma enhanced inkjet printing of particle-free silver ink on polyester fabric for electronic devices

    Plasma enhanced inkjet printing of particle-free silver ink on polyester fabric for electronic devices by Jones, Thomas D.A., Hourd, Andrew C., Liu, Tang Chung, Jia, Lu-Chiang, Lung, Chia-Mei, Zolotovskaya, Svetlana, Abdolvand, Amin, Tai, Chao-Yi

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  4. 4
    Diffractive optical element embedded in silver-doped nanocomposite glass

    Diffractive optical element embedded in silver-doped nanocomposite glass by Fleming, Lauren A H, Wackerow, Stefan, Hourd, Andrew C, Gillespie, W Allan, Seifert, Gerhard, Abdolvand, Amin

    Published in Optics express
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  5. 5
    Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks

    Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks by Smith, S., Tsiamis, A., McCallum, M., Hourd, A.C., Stevenson, J.T.M., Walton, A.J., Dixson, R.G., Allen, R.A., Potzick, J.E., Cresswell, M.W., Orji, N.G.

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  6. 6
    Comparison of Optical and Electrical Techniques for Dimensional Metrology on Alternating Aperture Phase-Shifting Masks

    Comparison of Optical and Electrical Techniques for Dimensional Metrology on Alternating Aperture Phase-Shifting Masks by Smith, S., Tsiamis, A., McCallum, M., Hourd, A.C., Stevenson, J., Walton, A.J.

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  7. 7
    On-mask CD and overlay test structures for alternating aperture phase shift lithography

    On-mask CD and overlay test structures for alternating aperture phase shift lithography by Smith, S., McCallum, M., Walton, A.J., Stevenson, J.T.M., Harris, P.D., Ross, A.W.S., Hourd, A.C., Liudi Jiang

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  8. 8
    Comparison of Optical and Electrical Techniques for Dimensional Metrology on Alternating Aperture Phase-Shifting Masks : International Conference on Microelectronic Test Structures

    Comparison of Optical and Electrical Techniques for Dimensional Metrology on Alternating Aperture Phase-Shifting Masks : International Conference on Microelectronic Test Structures by SMITH, Stewart, TSIAMIS, Andreas, MCCALLUM, Martin, HOURD, Andrew. C, STEVENSON, J. Tom M, WALTON, Anthony J

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  9. 9
    Silicon-germanium films for photomasking applications

    Silicon-germanium films for photomasking applications by CHI-WING LIU, CAIRNS, J. A, GIBSON, R. A. G, HOURD, A. C, LAWRENSON, B, LEECE, C. F

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