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Depth profiles and concentration percentages of SiO2 and SiOx induced by ion bombardment of a silicon (100) target
by
Lee, Chin Shuang
,
Chen, Chia Chan
,
Hsu, Chin Shun
,
Lee, Shyong
,
Hsu, Ron-Kai
Published in
Journal of materials science. Materials in electronics
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Depth profiles and concentration percentages of SiO2 and SiO x induced by ion bombardment of a silicon (100) target
by
Lee, Chin Shuang
,
Chen, Chia Chan
,
Hsu, Chin Shun
,
Lee, Shyong
,
Hsu, Ron-Kai
Published in
Journal of materials science. Materials in electronics
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Depth profiles and concentration percentages of SiO sub(2) and SiO sub(x) induced by ion bombardment of a silicon (100) target
by
Lee, Chin Shuang
,
Chen, Chia Chan
,
Hsu, Chin Shun
,
Lee, Shyong
,
Hsu, Ron-Kai
Published in
Journal of materials science. Materials in electronics
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Article
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Journal Title
Journal Of Materials Science. Materials In Electronics
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Electronics
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Applied Sciences
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Beams
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Bombardment
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Characterization And Evaluation Of Materials
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Chemistry And Materials Science
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Condensed Matter: Structure, Mechanical And Thermal Properties
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Exact Sciences And Technology
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Materials Science
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Microelectronic Fabrication
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Nanocrystalline Materials
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Optical And Electronic Materials
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Oxides
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Physics
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Radiation Effects On Specific Materials
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Semiconductor Electronics. Microelectronics. Optoelectronics. Solid State Devices
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Silicon
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Silicon Dioxide
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Silicones
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Structure Of Solids And Liquids; Crystallography
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Springer Link
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Springerlink 过刊(Nstl购买)
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Springer Nature - Connect Here First To Enable Access
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