Alterations of river flow caused by three types of hydropower plants in Slovenia and Croatia by Huđek, H., Carolli, M., Žganec, K., Pusch, T.M.

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Development of practice recommendations based on the Canadian Syncope Risk Score and identification of barriers and facilitators for implementation by Hudek, Natasha, Brehaut, Jamie C., Rowe, Brian H., Nguyen, Phuong Anh, Ghaedi, Bahareh, Ishimwe, Aline Christelle, Fabian, Christopher, Yan, Justin W., Sivilotti, Marco L. A., Ohle, Robert, Le Sage, Natalie, Mercier, Eric, Archambault, Patrick M., Plourde, Miville, Davis, Philip, McRae, Andrew D., Hegdekar, Mona, Thiruganasambandamoorthy, Venkatesh

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Universal Sex Differences in the Desire for Sexual Variety: Tests From 52 Nations, 6 Continents, and 13 Islands by Schmitt, David P

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Modelling soil erosion reduction by Mahonia aquifolium on hillslopes in Hungary: The impact of soil stabilization by roots by Hudek, Csilla, Sterk, Geert, van Beek, Rens L.P.H., de Jong, Steven M.

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Knowing when not to use the Internet: Shyness and adolescents’ on-line and off-line interactions with friends by Laghi, Fiorenzo, Schneider, Barry H., Vitoroulis, Irene, Coplan, Robert J., Baiocco, Roberto, Amichai-Hamburger, Yair, Hudek, Natasha, Koszycki, Diana, Miller, Scott, Flament, Martine

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Patterns and Universals of Mate Poaching Across 53 Nations: The Effects of Sex, Culture, and Personality on Romantically Attracting Another Person's Partner by Schmitt, David P

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Knowing when not to use the Internet: Shyness and adolescents' on-line and off-line interactions with friends : Youth internet and wellbeing by LAGHI, Fiorenzo, SCHNEIDER, Barry H, VITOROULIS, Irene, COPLAN, Robert J, BAIOCCO, Roberto, AMICHAI-HAMBURGER, Yair, HUDEK, Natasha, KOSZYCKI, Diana, MILLER, Scott, FLAMENT, Martine

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Knowing when not to use the Internet: Shyness and adolescentsa on-line and off-line interactions with friends by Laghi, Fiorenzo, Schneider, Barry H, Vitoroulis, Irene, Coplan, Robert J, Baiocco, Roberto, Amichai-Hamburger, Yair, Hudek, Natasha, Koszycki, Diana, Miller, Scott, Flament, Martine

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Mechanical characterization of membrane like microelectronic components by Držı́k, M., Löschner, H., Haugeneder, E., Fallman, W., Hudek, P., Rangelow, I.W., Sarov, Y., Lalinský, T., Chlpı́k, J.

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Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask by Dreeskornfeld, L., Haindl, G., Kleineberg, U., Heinzmann, U., Shi, F., Volland, B., Rangelow, I.W., Majkova, E., Luby, S., Kostic, Matay, L., Hrkut, P., Hudek, P., Lee, Hsin-Yi

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Evaluation and fabrication of AFM array for ESA-Midas/Rosetta space mission by Barth, W., Debski, T., Abedinov, N., Ivanov, Tz, Heerlein, H., Volland, B., Gotszalk, T., Rangelow, I.W., Torkar, K., Fritzenwallner, K., Grabiec, P., Studzińska, K., Kostic, I., Hudek, P.

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Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment by Volland, B., Shi, F., Heerlein, H., Rangelow, I. W., Hudek, P., Kostic, I., Cekan, E., Vonach, H., Loeschner, H., Horner, C., Stengl, G., Buschbeck, H., Zeininger, M., Bleeker, A., Benschop, J.

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Resolution improvement of ion projector with a low energy spread multicusp ion source by Bruenger, W.H., Torkler, M., Leung, K.N., Lee, Y., Williams, M.D., Loeschner, H., Stengl, G., Fallmann, W., Paschke, F., Stangl, G., Rangelow, I.W., Hudek, P.

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DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing by Bruenger, W.H., Buschbeck, H., Cekan, E., Eder, S., Fedynyshyn, T.H., Hertlein, W.G., Hudek, P., Kostic, I., Loeschner, H., Rangelow, I.W., Torkler, M.

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Silicon stencil masks for masked ion beam lithography proximity printing by Rangelow, I.W., Shi, F., Hudek, P., Kostic, I., Hammel, E., Löschner, H., Stengl, G., Cekan, E.

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Dry etching with gas chopping without rippled sidewalls by Volland, B., Shi, F., Hudek, P., Heerlein, H., Rangelow, Ivo. W.

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Sub-0.25-μm ion projection lithography (IPL) in PMMA- and novolak-based resist materials (RAY-PF, RAY-PN, SAL-603) by Cekan, E., Fallmann, W., Friza, W., Paschke, F., Stangl, G., Hudek, P., Bayer, E., Kraus, H.

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Micro structuring of photoresist with femtosecond laser pulses by Zoppel, S., Partel, S., Choleva, P., Hudek, P., Huber, H., Lederer, M., der Au, J. Aus, Reider, G.A.

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Cathode sputtered permalloy films of high AMR effect and low coercivity by Stangl, G., Aigner, P., Hudek, P., Kostic, I., Chabicovsky, R., Hauser, H., Hochreiter, J., Riedling, K.

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Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices by Bruenger, W. H., Torkler, M., Weiss, M., Löschner, H., Leung, K., Lee, Y., Hudek, P., Rangelow, I. W., Stangl, G., Fallmann, W.

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