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Mask-edge effects at low ion implantation energies for cluster covered silicon
by
Hul'ko, O.V
,
Danailov, D
,
Karpuzov, D
,
Zinke-Allmang, M
Published in
Physica. B, Condensed matter
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Physica B: Condensed Matter
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Physica. B, Condensed Matter
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Applied Sciences
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Clusters
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Condensed Matter Physics
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Electrical And Electronic Engineering
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Electronic, Optical And Magnetic Materials
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Lithography, Masks And Pattern Transfer
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Mask-Edge Effects
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Microelectronic Fabrication
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Physics
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Physics, Condensed Matter
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Selective Etching
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Semiconductor Electronics. Microelectronics. Optoelectronics. Solid State Devices
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Surface Patterning
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