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On the role of halides and thiols in additive-assisted copper electroplating
by
Huynh, Thi M.T.
,
Weiss, Florian
,
Hai, Nguyen T.M.
,
Reckien, Werner
,
Bredow, Thomas
,
Fluegel, Alexander
,
Arnold, Marco
,
Mayer, Dieter
,
Keller, Hubert
,
Broekmann, Peter
Published in
Electrochimica acta
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Competitive Anion/Water and Cation/Water Interactions at Electrified Copper/Electrolyte Interfaces Probed by in Situ X-ray Diffraction
by
Keller, Hubert
,
Saracino, Martino
,
Nguyen, Hai M.T
,
Huynh, Thi Mien Trung
,
Broekmann, Peter
Published in
Journal of physical chemistry. C
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Electrochimica Acta
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Journal Of Physical Chemistry. C
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The Journal Of Physical Chemistry C
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Subjects
Physical Sciences
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Science & Technology
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Additives
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Chemistry
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Chemistry, Physical
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Condensed Matter: Structure, Mechanical And Thermal Properties
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Copper
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Copper Electrodeposition
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Density Functional Theory
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Dft
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Doping
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Electrochemistry
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Electrodeposition
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Electroplating
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Exact Sciences And Technology
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Halides
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Inductively Coupled Plasma
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Liquid Thin Films
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Mass Spectroscopy
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Materials Science
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American Chemical Society:jisc Collections:american Chemical Society Read & Publish Agreement 2022-2024 (Reading List)
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Sciencedirect Journals
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Sciencedirect Freedom Collection
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Sciencedirect Physical & Analytical Chemistry Backfile
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