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    Continuity and morphology of TaN barriers deposited by Atomic Layer Deposition and comparison with physical vapor deposition

    Continuity and morphology of TaN barriers deposited by Atomic Layer Deposition and comparison with physical vapor deposition by Besling, Wim F.A., Ignacimouttou, Marie-Laurence, Humbert, Aurelie, Mellier, Maxime, Torres, Joaquin

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