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Electrical properties of unintentionally doped β-Ga2O3 (010) thin films grown by a low-pressure hot-wall metalorganic chemical vapor deposition
by
Morihara, Jun Jason
,
Inajima, Jin
,
Wang, Zhenwei
,
Yoshinaga, Junya
,
Sato, Shota
,
Eguchi, Kohki
,
Tsutsumi, Takuya
,
Kumagai, Yoshinao
,
Higashiwaki, Masataka
Published in
Japanese Journal of Applied Physics
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Electrical properties of unintentionally doped β-Ga 2 O 3 (010) thin films grown by a low-pressure hot-wall metalorganic chemical vapor deposition
by
Morihara, Jun Jason
,
Inajima, Jin
,
Wang, Zhenwei
,
Yoshinaga, Junya
,
Sato, Shota
,
Eguchi, Kohki
,
Tsutsumi, Takuya
,
Kumagai, Yoshinao
,
Higashiwaki, Masataka
Published in
Japanese Journal of Applied Physics
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Journal Title
Japanese Journal Of Applied Physics
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Subjects
Capacitance-Voltage Characteristics
1 results
1
Current Voltage Characteristics
1 results
1
Electrical Properties
1 results
1
Gallium Oxide (Ga
1 results
1
Gallium Oxides
1 results
1
Low Pressure
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1
Metal Organic Chemical Vapor Deposition
1 results
1
Metalorganic Chemical Vapor Deposition
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Physical Sciences
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1
Physics
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Physics, Applied
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Schottky Barrier Diode
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Schottky Diodes
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Science & Technology
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Thin Films
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Unintentionally Doped
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Year of Publication
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Institute Of Physics Iopscience Extra
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