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Stochastic Simulation Study of Pattern Formation in EUV resists with Photo-Decomposable Quenchers
by
Imai, Kyohei
,
Inoue, Bunta
,
Hirai, Yoshihiko
,
Yasuda, Masaaki
Published in
Journal of Photopolymer Science and Technology
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Stochastic Simulation of Development Process in Electron Beam Lithography
by
Inoue, Bunta
,
Koyama, Masanori
,
Sekiguchi, Atsushi
,
Shirai, Masamitsu
,
Hirai, Yoshihiko
,
Yasuda, Masaaki
Published in
Journal of Photopolymer Science and Technology
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Prediction of secondary electron yield for metal materials using deep learning
by
Kusumi, Masahiro
,
Inoue, Bunta
,
Hirai, Yoshihiko
,
Yasuda, Masaaki
Published in
Microscopy
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An Electronic Microsaccade Circuit with Charge-Balanced Stimulation and Flicker Vision Prevention for an Artificial Eyeball System
by
Liang, Yaogan
,
Nakamura, Kohei
,
Du, Bang
,
Wang, Shengwei
,
Inoue, Bunta
,
Aruga, Yuta
,
Kino, Hisashi
,
Fukushima, Takafumi
,
Kiyoyama, Koji
,
Tanaka, Tetsu
Published in
Electronics (Basel)
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