Effects of notch position of the Charpy impact specimen on the failure behavior in heat affected zone by Jang, Y.C., Hong, J.K., Park, J.H., Kim, D.W., Lee, Y.

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Effect of isothermal transformation temperature on amount of retained austenite and its thermal stability in a bainitic Fe–3%Si–0.45%C–X steel by Lee, Y.K., Shin, H.C., Jang, Y.C., Kim, S.H., Choi, C.S.

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Alloderm? and thin skin graft after scar shaving and release in post-burn scar contracture by Oh, S.J, Jang, Y.C, Lee, J.W, Seo, D.K, Koh, J.H

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Relationship between the temperament and psychiatric morbidity in children with burn injury by Son, H.-G, Oh, S.J, Jang, Y.C, Jung, J, Kim, S.N, Lee, G.S

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Tissue expansion technique for the correction of the burn alopecia by Oh, S.J, Jang, Y.C, Lee, J.W, Seo, D.K, Koh, J.H, Kim, Y.J

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Microvascular free flap reconstruction in burns injuries by Oh, S.J, Jang, Y.C, Lee, J.W, Seo, D.K, Koh, J.H, Koh, T.B

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Clinical use of heparin in acute second degree burns by Oh, S.J, Jang, Y.C, Lee, J.W, Seo, D.K, Koh, J.H, Kim, S.J, Jung, Y.R

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Experimental and finite element analysis for fracture of coating layer of galvannealed steel sheet by KIM, S.I., HER, J.U., JANG, Y.C., LEE, Y.

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Chemical dry etching of silicon nitride in F 2/Ar remote plasmas by Hwang, J.Y., Kim, D.J., Lee, N.-E., Jang, Y.C., Bae, G.H.

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Chemical dry etching of silicon oxide in F 2/Ar remote plasmas by Kang, S.C., Kim, D.J., Hwang, J.Y., Yun, Y.B., Lee, N.-E., Jang, Y.C., Bae, G.H.

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Chemical dry etching of silicon nitride in F2/Ar remote plasmas by HWANG, J. Y, KIM, D. J, LEE, N.-E, JANG, Y. C, BAE, G. H

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Chemical dry etching of silicon oxide in F2/Ar remote plasmas by KANG, S. C, KIM, D. J, HWANG, J. Y, YUN, Y. B, LEE, N.-E, JANG, Y. C, BAE, G. H

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Leaching Behavior and Flux of Toxic Metals from Chromated Copper Arsenate-Treated Wood and Chromated Copper Arsenate-Treated Wood Ash by Jang, Y.C, Yoon, H, Kang, H

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The interface formation and adhesion of metals (Cu, Ta, and Ti) and low dielectric constant polymer-like organic thin films deposited by plasma-enhanced chemical vapor deposition u... by Kim, K.S., Jang, Y.C., Kim, H.J., Quan, Y.-C., Choi, J., Jung, D., Lee, N.-E.

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Properties of amorphous tin-doped indium oxide thin films deposited by O2/Ar mixture ion beam-assisted system at room temperature by KIM, H. J, BAE, J. W, KIM, J. S, KIM, K. S, JANG, Y. C, YEOM, G. Y, LEE, N.-E

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Properties of amorphous tin-doped indium oxide thin films deposited by O 2/Ar mixture ion beam-assisted system at room temperature by Kim, H.J., Bae, J.W., Kim, J.S., Kim, K.S., Jang, Y.C., Yeom, G.Y., Lee, N.-E.

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Electrical, optical, and structural characteristics of ITO thin films by krypton and oxygen dual ion-beam assisted evaporation at room temperature by Kim, H.J., Bae, J.W., Kim, J.S., Kim, K.S., Jang, Y.C., Yeom, G.Y., Lee, N.-E.

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Study of electrical and interfacial properties of CVD-W/p-Si 0.83Ge 0.17/Si(001) by Jang, Y.C., Kim, K.S., Shin, D.O., Kim, H.J., Shim, K.-H., Lee, N.-E., Youn, S.P., Roh, K.J., Roh, Y.H.

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Study of electrical and interfacial properties of CVD-W/p-Si0.83Ge0.17/Si(001) by Jang, Y.C., Kim, K.S., Shin, D.O., Kim, H.J., Shim, K.-H., Lee, N.-E., Youn, S.P., Roh, K.J., Roh, Y.H.

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System based SQA and implementation of SPI for successful projects by Lee, J.W., Jung, S.H., Park, S.C., Lee, Y.J., Jang, Y.C.

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