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    Effect of film composition and structure on the crystallization point of atomic layer deposited HfAlox using metal (diethylamino) precursors and ozone

    Effect of film composition and structure on the crystallization point of atomic layer deposited HfAlox using metal (diethylamino) precursors and ozone by KATAMREDDY, Rajesh, INMAN, Ronald, JURSICHA, Gregory, SOULET, Axel, TAKOUDIS, Christos

    Published in Acta materialia
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