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A 32nm low power RF CMOS SOC technology featuring high-k/metal gate
by
VanDerVoorn, P
,
Agostinelli, M
,
Choi, S
,
Curello, G
,
Deshpande, H
,
El-Tanani, M A
,
Hafez, W
,
Jalan, U
,
Janbay, L
,
Kang, M
,
Koh, K
,
Komeyli, K
,
Lakdawala, H
,
Lin, J
,
Lindert, N
,
Mudanai, S
,
Park, J
,
Phoa, K
,
Rahman, A
,
Rizk, J
,
Rockford, L
,
Sacks, G
,
Soumyanath, K
,
Tashiro, H
,
Taylor, S
,
Tsai, C
,
Xu, H
,
Xu, J
,
Yang, L
,
Young, I
,
Yeh, J
,
Yip, J
,
Bai, P
,
Jan, C
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RF CMOS technology scaling in High-k/metal gate era for RF SoC (system-on-chip) applications
by
Jan, C.-H
,
Agostinelli, M
,
Deshpande, H
,
El-Tanani, M A
,
Hafez, W
,
Jalan, U
,
Janbay, L
,
Kang, M
,
Lakdawala, H
,
Lin, J
,
Lu, Y.-L
,
Mudanai, S
,
Park, J
,
Rahman, A
,
Rizk, J
,
Shin, W.-K
,
Soumyanath, K
,
Tashiro, H
,
Tsai, C
,
VanDerVoorn, P
,
Yeh, J.-Y
,
Bai, P
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