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    Dual-Workfunction Gate Engineering in a Corner Parasitics-Free Shallow-Trench-Isolation Complementary-Metal-Oxide-Semiconductor Technology

    Dual-Workfunction Gate Engineering in a Corner Parasitics-Free Shallow-Trench-Isolation Complementary-Metal-Oxide-Semiconductor Technology by Schwalke, Udo, Füldner, Marc, Bothe, WalterZatsch, Janssen, DariuschHadawi, Schon, Peter

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