Search Results - Jeng, Shwang-Ming

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  1. 1
    Leakage mechanism in Cu damascene structure with methylsilane-doped low-K CVD oxide as intermetal dielectric

    Leakage mechanism in Cu damascene structure with methylsilane-doped low-K CVD oxide as intermetal dielectric by Wu, Zhen-Cheng, Chiang, Chiu-Chih, Wu, Wei-Hao, Chen, Mao-Chieh, Jeng, Shwang-Ming, Li, Lain-Jong, Jang, Syun-Ming, Yu, Chen-Hua, Liang, Mong-Song

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  2. 2
    Physical and electrical characteristics of methylsilane-and trimethylsilane-doped low dielectric constant chemical vapor deposited oxides

    Physical and electrical characteristics of methylsilane-and trimethylsilane-doped low dielectric constant chemical vapor deposited oxides by WU, Zhen-Cheng, SHIUNG, Zhi-Wen, LIANG, Mong-Song, CHIANG, Chiu-Chih, WU, Wei-Hao, CHEN, Mao-Chieh, JENG, Shwang-Ming, WENG CHANG, CHOU, Pei-Fen, JANG, Syun-Ming, YU, Chen-Hua

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  3. 3
    Physical and electrical characteristics of F- and C-doped low dielectric constant chemical vapor deposited oxides

    Physical and electrical characteristics of F- and C-doped low dielectric constant chemical vapor deposited oxides by WU, Zhen-Cheng, SHIUNG, Zhi-Wen, LIANG, Mong-Song, CHIANG, Chiu-Chih, WU, Wei-Hao, CHEN, Mao-Chieh, JENG, Shwang-Ming, WENG CHANG, CHOU, Pei-Fen, JANG, Syun-Ming, YU, Chen-Hua

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